Deposition of amorphous hydrogenated carbon coatings by plasma jet
[ 1 ] Instytut Fizyki, Wydział Fizyki Technicznej, Politechnika Poznańska | [ P ] employee
2008
scientific article
english
EN In this study amorphous hydrogenated carbon films (a-C:H) were formed on Si (111) from an Ar–C2H2 and Ar–C2H2–H2 gas mixtures at 1000 Pa pressure using a plasma jet chemical vapour deposition. It is shown that by varying the Ar:C2H2 ratio and adding the hydrogen gas in plasma, the structure, surface morphology, growth rate of the coatings, and consequently their optical properties can be controlled.
1063 - 1066
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final published version
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