Deposition of amorphous hydrogenated carbon coatings by plasma jet
[ 1 ] Instytut Fizyki, Wydział Fizyki Technicznej, Politechnika Poznańska | [ P ] pracownik
2008
artykuł naukowy
angielski
EN In this study amorphous hydrogenated carbon films (a-C:H) were formed on Si (111) from an Ar–C2H2 and Ar–C2H2–H2 gas mixtures at 1000 Pa pressure using a plasma jet chemical vapour deposition. It is shown that by varying the Ar:C2H2 ratio and adding the hydrogen gas in plasma, the structure, surface morphology, growth rate of the coatings, and consequently their optical properties can be controlled.
1063 - 1066
witryna wydawcy
ostateczna wersja opublikowana
0,321