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Article

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Title

Preparation of an ultraclean and atomically controlled hydrogen-terminated Si(111)-(1 1) surface revealed by high resolution electron energy loss spectroscopy, atomic force microscopy, and scanning tunneling microscopy: aqueous NH4F etching process of Si(111)

Authors

[ 1 ] Instytut Fizyki, Wydział Fizyki Technicznej, Politechnika Poznańska | [ P ] employee

Year of publication

2007

Published in

Japanese Journal of Applied Physics

Journal year: 2007 | Journal volume: vol. 46 | Journal number: no. 9A

Article type

scientific article

Publication language

english

Pages (from - to)

5701 - 5705

Impact Factor

1,247

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